Eonni pure mask 純淨抗敏舒緩面膜
for sensitive skin
All-round anti-allergy, soothing and calming
Take care of the fragile and meticulous you
Using a gentle natural plant formula, can condition sensitive skin, enhance the ability of cells to resist external stimuli, and relieve skin sensitivity. With hyaluronic acid and other moisturizing ingredients, it can effectively lock the skin's moisture and keep the skin in a supple and healthy state.
After cleansing, take out the mask and apply it to the face. After 10-15 minutes, remove the mask and gently massage the face to help absorb the remaining essence or wipe away the excess essence with wet cotton.
for sensitive skin
Aqua, Butylene Glycol, Betaine, Trehalose, Hydroxyethyl Urea, Chamomilla Recutita (Matricaria) Flower Extract, Centella Asiatica Extract, Camellia Sinensis Leaf Extract, Scutellaria Baicalensis Root Extract, Polygonum Cuspidatum Root Extract, Glycyrrhiza Glabra (Licorice) Root Extract, Rosmarinus Officinalis (Rosemary) Extract, Panthenol, Sodium Hyaluronate, Glycerin, Allantoin, Propanediol, Dipotassium Glycyrrhizate, Carbomer, Aminomethyl Propanol, Caprylhydroxamic Acid
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Due to hygiene reasons and/or suppliers' requests, we do not accept returns for this item.
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